High Linearity in Atomic Force Microscopy

Precision Nanometrology for Challenging Problems

  • Schaefer Tec, Park System XESchaefer Tec, Park System XE
  • Schaefer Tec, Park System XE
  • Park Systems XE Atomic Force Microscopes provide completely eliminated background curvature
  • Park Systems XE Atomic Force Microscopes provide completely eliminated background curvature

Park Systems XE (which stands for crosstalk elimination) Atomic Force Microscopes provide completely eliminated background curvature thanks to the flexure XY scanners and show no bowing even on scans of the flattest samples. This enables precision nanometrology for challenging problems in research and industry. Position sensors provide linear feedback control for high accuracy, high precision measurements.
Also the Z (vertical) movement is completely decoupled from the other axes, and has a very high resonance frequency. This does not only guarantee high precision metrology measurements, it also is a precondition for the True Non-Contact Mode, one of the distinctive advantages of Park Systems' XE-AFMs. It is a powerful method which enables AFM users to image and measure samples that other measurement or imaging techniques can not. Besides that, AFM tips are preserved from wear and even high resolution tips with very fine tip radius stay sharp for a very long time
A variety of new hardware and software features have been added to the Park XE AFM's recently. High Voltage Scanning Kelvin Probe Microscopy or Piezo Force Microscopy is for example possible up to 175 Volt. Or there is the new matchable scan function to adapt the scan speed to the sample surface topography.

Park Systems AFM are distributed in Europe by the Schafer Technology group. Contact the nearest Schaefer office to obtain further information. Schaefer offices are in Germany, Poland, Switzerland, Italy, France and Romania

Contact

Schaefer-Tec AG
Badimatte 21
3422 Kirchberg
Switzerland
Phone: +41 34 423 70 70

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