XEI Scientific's has announced that their Evactron Plasma Cleaning System for electron microscopes and other vacuum chambers now numbers more than 1,000 units worldwide.
The Evactron in situ plasma cleaning solution is now seen as the standard for removal of hydrocarbon-based contamination in a large variety of vacuum systems around the world.
Offered for nearly all makes of electron microscopes, dual beam FIBs and other imaging tools with clean vacuum requirements, this proven, safe technology has provided cost effective contamination removal for the most demanding imaging and metrology applications.
All XEI products have a five year warranty and include a RF plasma generator and patented RF electrode.
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XEI Scientific Inc.
1755 E Bayshore Road
Redwood Ci 94063, CA
Imaging & Microscopy Issue 1 , 2013 as free epaper or pdf download