Mar. 17, 2011

XEI Scientific Announces Shipment of 1000th Evactron System

XEI Scientific's has announced that their Evactron Plasma Cleaning System for electron microscopes and other vacuum chambers now numbers more than 1,000 units worldwide.
The Evactron in situ plasma cleaning solution is now seen as the standard for removal of hydrocarbon-based contamination in a large variety of vacuum systems around the world. moreFeb. 15, 2011

3D Nanometer-Scale Characterization: Helios NanoLab DualBeam System from FEI

FEI has announced a solution for 3D, nanometer-scale characterization of pore networks. The Helios NanoLab DualBeam system images kerogen, porosity and microstructures in three dimensions (3D) with nanometer-scale resolution. The data are essential to determining the production potential of unconventional gas reservoirs, optimizing extraction procedures and designing simulators of the nanoscale pore structure. moreMay. 18, 2010

DualBeam Microscope

FEI Company introduced the Helios NanoLab x50 DualBeam Series. The Helios 450 series is designed primarily for today's advanced semiconductor labs that are dealing with numerous challenges, including shrinking dimensions at sub 32nm nodes; advanced packaging techniques, such as TSVs and multi-die stacks; as well as a higher volume of samples requiring TEM imaging. The Helios 650 is designed for academic and industrial research centers that need to do advanced material characterization and modification down to the single nanometer scale. more