Apr. 02, 2013
The development of nanostructured lacquers and propellants needs to master the cellulose nitrate processing on the nanoscale. The challenge is the deposition of single cellulose nitrate molecules to image them with molecular resolution. We report on the effect of solvent, shaking duration and deposition techniques, from which the spray technique succeeded, for the first time to our knowledge, to image by Atomic Force Microscopy, individual molecular cellulose nitrate polymeric chains.
moreMar. 18, 2013
The self-assembly of gold nanoparticles (Au NPs) coated with specific organic ions in water was observed by Center for Nanoscale Materials staff in the Nanobio Interfaces, Electronic & Magnetic Materials & Devices, and Nanophotonics groups using in situ transmission electron microscopy (TEM) equipped with a liquid cell. The Au NPs formed one-dimensional chains within a few minutes.
moreMar. 04, 2013
Electron channeling contrast imaging (ECCI) is a powerful technique for the quantitative characterization of deformation structures in the SEM. The coupling of ECCI with EBSD provides an efficient method to attain enhanced diffraction contrast in the SEM. The EBSD-based ECCI set-up allows the imaging of dislocation and nano-twin substructures in the SEM. Some examples of quantitative microstructural characterization on structural materials are provided.
moreFeb. 26, 2013
The new materials microscope Leica DM2700 M from Leica Microsystems is ideal for all kinds of routine inspection tasks in metallography, earth science, forensic investigation, and materials quality control and research. It offers users state-of-the-art universal white-light LED illumination with high-quality Leica optics.
moreFeb. 19, 2013
Researchers at the London Centre for Nanotechnology (LCN) have revealed detailed 3D images of an important industrial coating that is used to reduce corrosion of ship hulls. The work, carried out in collaboration with international paints and coatings company Akzo-Nobel, allows the automatic identification of aluminium, talc, pigment and remaining filler components in the image, based solely on X-ray refractive data.
moreFeb. 07, 2013
X-ray microscopy requires radiation of extremely high quality. In order to obtain sharp images instrument and sample must stay absolutely immobile even at the nanometer scale during the recording. Researchers at the Technische Universitaet Muenchen and the Paul Scherrer Institute in Villigen (Switzerland), have now developed a method that relaxes these hard restrictions. Even fluctuations in the material can be visualized. Results are published in Nature.
moreFeb. 04, 2013
Structured substrates are widely employed in semiconductor research and especially in current semiconductor development. The high demands on device quality and reliability make it increasingly important to have a detailed knowledge of the inherent strain and crystalline properties of device structures. X-ray diffraction is commonly used in order to probe film thicknesses, lattice constants and strain states of layer structures and scanning electron microscopy (SEM) is used to inspect surfaces and defects in the structure to understand the growth history.
moreFeb. 01, 2013
Neither smooth nor disordered, gamma-alumina nanoparticles are corrugated with tiny pores inside, according to scientists at Pacific Northwest National Laboratory. Using a powerful transmission electron microscope, the team obtained ultrahigh-resolution images and chemical data about the particle's surface. They found that the particles were covered with ridges made from a more open, yet symmetrical, arrangement of atoms. The open arrangement on the surfaces, notated as (110), covers 70% of the nanoparticle.
moreOct. 11, 2012
The theoretical and experimental framework of a new coherent diffraction strain imaging approach was developed in the Center for Nanoscale Materials' X-Ray Microscopy Group in collaboration with Argonne's Materials Science Division, together with users from IBM.
moreAug. 28, 2012
Cambridge Technology Systems has reported about the new ultra high resolution objective lens of the Hitachi S5200 FESEM.
The objective lens now allows 0.5nm imaging at 30kV and improved performance at low kV operation conditions. Cambridge Technology Systems has available a guaranteed second user instrument of this type at considerable saving on new cost with engineer installation included. Engineer support is also available throughout the EU.