You are here: Home

Metrology

Feb. 02, 2012

WITec Wins Photonics Prism Award 2011

WITec has received the prestigious Photonics Prism Award 2011 for the development of TrueSurface Microscopy. This internationally respected product innovation award recognizes cutting-edge products that break conventional ideas and improve life through photonics and is presented each year by SPIE and Photonics Media. more
Cobolt Releases High Performance Diode Laser Modules
Dec. 08, 2011

Cobolt Releases High Performance Diode Laser Modules

Cobolt has released the Cobolt MLD Series lasers, high performance laser diode modules covering a spectral range between 405 and 660 nm. more
Sep. 26, 2011

Mad City Labs: Direct European Sales Office in Switzerland

Mad City Labs announced the opening of a direct sales office located in Zürich, Switzerland. The establishment of Mad City Labs GmbH will enhance the service and support to the European customers, and strengthen the relationships with the distribution network and business partners.

Mad City Labs is a US manufacturer of piezoactuated, closed loop nanopositioning systems for use in metrology, photonics, and microscopy applications. Product catalog can be viewed online.

http://www.madcitylabs.eu/
more
Bruker Releases Atomic Force Microscope for Patterned Sapphire Substrate Metrology
Aug. 16, 2011

Bruker Releases Atomic Force Microscope for Patterned Sapphire Substrate Metrology

With the Dimension Edge PSS Atomic Force Microscope, Bruker has introduced a production-environment Atomic Force Microscope specifically tailored for patterned sapphire substrate (PSS) metrology in high brightness light-emitting diode (HB-LED) manufacturing. more
Nanomechanical Sensor for Atomic Force Microscopy
Jun. 07, 2011

Nanomechanical Sensor for Atomic Force Microscopy

The atomic force microscope (AFM) is an important tool for nanoscale surface metrology. Typical AFMs map local tip-surface interactions by scanning a flexible cantilever probe over a surface. They rely on bulky optical sensing instrumentation to measure the motion of the probe, which limits the sensitivity, stability, and accuracy of the microscope, and precludes the use of probes much smaller than the wavelength of light. more
Jan. 18, 2011

University of Notre Dame Finds a Partner in Olympus

The University of Notre Dame (Indiana, USA) has named Olympus a key partner for its College of Engineering. The college recently constructed a new 160,000-square-foot, US-$ 70 million structure called Stinson-Remick Hall, which houses a nanotechnology research center, the University's new Energy Center, an undergraduate interdisciplinary learning center and a 9,000-square-foot semiconductor processing and device fabrication clean room. more
Quantitative Microscopy without Lenses
Dec. 27, 2010

Quantitative Microscopy without Lenses

Minimisation of the geometric restrictions and image infidelities imposed by imperfect physical focussing devices has been the subject of microscopy research for many decades, as has the development of ways to recover information-rich phase data lost by detectors that are sensitive only to illumination intensity. more
Aug. 17, 2010

Bruker to Acquire Veeco's Scanning Probe Microscopy (SPM) and Optical Industrial Metrology (OIM) ...

Bruker Corporation announces the signing of an agreement to acquire the Scanning Probe Microscopy (SPM) and Optical Industrial Metrology (OIM) instruments business from Veeco Instruments for US-$ 229 million in cash. The transaction has been approved by the Boards of Directors of both companies and is expected to close during the fourth quarter of 2010, pending regulatory review and subject to customary closing conditions. more
High Linearity in Atomic Force Microscopy
May. 16, 2010

High Linearity in Atomic Force Microscopy

Park Systems XE (which stands for crosstalk elimination) Atomic Force Microscopes provide completely eliminated background curvature thanks to the flexure XY scanners and show no bowing even on scans of the flattest samples. This enables precision nanometrology for challenging problems in research and industry. Position sensors provide linear feedback control for high accuracy, high precision measurements. more
Optical Micro- and Nano- Metrology
Mar. 10, 2010

Optical Micro- and Nano- Metrology

To image and measure small structures, forms and surface roughness has become more easy, fast and versatile with the Sensofar PLµ Neox, distributed by the Schaefer-Tec group. The optical profilometers of the PLµ series combine the two complementary measuring techniques of confocal microscopy and interferometry in one and the same instrument. With this, high resolution 3-D imaging and dimensional measurements of nearly all kinds of surfaces are obtained easily and fast. more
RSS Newsletter