Jul. 10, 2011
The analysis of light elements (from Be to F, refer to periodic table in fig. 1) presents a special challenge for energy dispersive X-ray spectrometry (EDS). Some of the problems are due to inherent physical effects, while others are technical in nature, relating to the design of the instrument used for analysis and the measurement procedure. Along with the demand for fast and efficient tools for analysis at the micro- and nanometer scale, the need for light element analysis with EDS has grown.
moreMay. 04, 2011
FEI Company has announced that elemental mapping at the atomic-level is now possible across the periodic table using ChemiSTEM Technology.
The combination of increased current in an atomic-sized probe by Cs-correction and the increase in X-ray detection sensitivity and beam current of the ChemiSTEM Technology allows results to be obtained within minutes.
moreMar. 21, 2011
Jeol has announced that they now offer InTouch Scope, an analytical, low vacuum Scanning Electron Microscope (SEM) with integrated EDS analysis and multi-touch screen functionality.
moreFeb. 21, 2011
Oxford Instruments has completed the installation of its 1000th X-Max:
X-Max was introduced to the market over two years ago and was the world's first "Large Area" silicon drift detector with an effective sensor area of 80mm2. The installation of the 1000th X-Max took place at Atotech in Berlin, Germany.
moreMar. 31, 2010
Organic and mineral samples, containing light elements like oxygen, nitrogen or beryllium have been analyzed using an attachable X-ray optic with an SDD in SEM. Compared to the measurements without the additional optic, there is a significant increase of the detection sensitivity for X-rays in the energy range below 1 keV. In contrast the spectrum above 1 keV is not affected. The optic can provide similar intensities for low and high energy X-ray lines even at high accelerating voltage.
moreNov. 03, 2009
The development of modern technology affects the science of small objects in two ways. On one hand better means for handling, imaging and analysis of miniature objects are provided, which means we can try and understand our world on a much smaller scale. On the other hand further miniaturization in manufacturing necessitates the control of technological processes at a minimum of one order of magnitude below the aspired device size. The need for rapid and efficient nanoanalysis is growing very quickly. The next generation 22 nm node in microelectronics architecture is approaching.
moreJul. 01, 2007
Thomas Schülein opened EDS Microanalysis Colloquium in Berlin: Exciting new insights into EDS microanalysis were delivered at the colloquium "New developments in EDS Analysis at the Scanning Electron Microscope - 4th Generation Liquid Nitrogen Free Silicon Drift Detectors (SDD)" from June 11th to 12th in Berlin Adlershof. Over 120 scientists from Germany, Austria and Switzerland attended the event initiated by Bruker AXS Microanalysis in cooperation with the Federal Institute for Materials Research & Testing (BAM) and the Physikalisch Technische Bundesanstalt (PTB).