X-ray Optics
Oct. 31, 2011
Scientists at the U.S. Department of Energy's Lawrence Berkeley National Laboratory (Berkeley Lab) have partnered with colleagues at semiconductor manufacturers to create the world's most advanced extreme-ultraviolet (EUV) microscope. Called SHARP (a succinct acronym for a long name, the Semiconductor High-NA Actinic Reticle Review Project), the new microscope will be dedicated to photolithography, the central process in the creation of computer chips.
moreJul. 13, 2010
The macroscopic properties of technical materials are often determined by their elemental composition. Because most technical materials are inhomogeneous analytical methods are required that allow elemental analysis of these inhomogeneities - not only as a point by point measurement but also as a complete 2D-distribution. Micro X-ray fluorescence (µ XRF) has recently been established for this purpose.
moreMar. 01, 2005
Extreme Ultraviolet Light (EUV) Holography for X-ray Lenses. Holography with extreme ultraviolet light (EUV) could be the solution for rapid mass production processes of high-performance lenses in the x-ray region. Emerging techniques like x-ray microscopy and advanced lithography are placing continual demands on the imaging resolution of x-ray optics. Today, the best lenses base on electron-beam written Fresnel Zone Plates, which offer an imaging resolution in the order of 20 nm.
moreMar. 01, 2005
Electron probe micro analysis (EPMA) and x-ray fluorescence (XRF) analysis for exact results.
Summary
A focused x-ray beam can excite the sample in a scanning electron microscope. The spectral background is reduced significantly in comparison to electron excitation because there is no “bremsstrahlung“. This enhances the peak-to-background ratio and also the sensitivity for traces.
Introduction
more