Better in Vacuum

Advantages of High Vacuum Environment for Electrical Atomic Force Microscopy AFM

  • The NX-Hivac from Park Systems enables users to do Scanning Spreading Resistance Microscopy (SSRM) and Conductive AFM (C-AFM)  in High Vacuum  The NX-Hivac from Park Systems enables users to do Scanning Spreading Resistance Microscopy (SSRM) and Conductive AFM (C-AFM) in High Vacuum
  • The NX-Hivac from Park Systems enables users to do Scanning Spreading Resistance Microscopy (SSRM) and Conductive AFM (C-AFM)  in High Vacuum
  • SSRM Air vs High Vacuum
  • SSRM of Li ion battery electrode
  • C-AFM from the same 3-4 layered MoS2 sample showing the increased current level and sensitivity under high vacuum. (a) and (b) Topography (c) current images in air at 5 V bias. and (d) current images taken immediately after pumping to high vacuum at 0.5 V bias. The data taken in air and high vacuum was acquired using identical parameters: same probe with spring constant k of 7 N/m, set point of 10 nN, and 1 Hz scan rate. Scale bar is 500 nm. Image courtesy: IMEC, Leuven, Belgium

Did you know that performing nanoscale measurements in High Vacuum significantly improves the sensitivity and resolution of the acquired data and enhanced the material analysis? Because high vacuum scanning offers greater accuracy and better repeatability than ambient or dry N2 conditions, users can measure a wide range of dopant concentration and signal response in failure analysis applications.

Scanning Spreading Resistance Microscopy (SSRM) in the high vacuum, available on Park NX-Hivac, enables 2D carrier profiling of next generation devices and measures the high resolution SSRM image under high vacuum conditions to improve production yield.

SSRM enables:

  • higher sensitivity and resolution in high vacuum compared to the ambient conditions,
  • higher accuracy and repeatability of the measurements,
  • acquisition of multiple properties simultaneously (electrical, mechanical, topography),
  • longer tip lifetime and reduced sample damage when performed in PinPoint mode,
  • frictionless imaging when performed in PinPoint mode.

Read an application note for SSRM here!

Conductive AFM (C-AFM) performed in High Vacuum for a better material analysis

Performing C-AFM measurements in High Vacuum (HV) improves the quality of the image significantly. In particular, the measured current increases by three orders of magnitude in comparison to ambient conditions and features high homogeneity. The current maps taken in HV also show remarkably more details than taken in air.

C-AFM enables:

  • obtaining high quality data for both topography and current measurements,
  • homogeneous and higher current signal when performed in high vacuum in comparison to ambient condition,
  • high resolution imaging due to the elimination of frictional force when performed in PinPoint mode,
  • accurate mapping of the current variations at the surface due to ability to control the contact force and time when performed in PinPoint mode.

Read the latest application paper from imec, Belgium on the advantages of high vacuum for electrical measurements utilizing the capabilities of the Park NX-Hivac atomic force microscopy system (Park Systems) using MoS2 as an example material.

 

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Janderstrasse 5
68199 Mannheim
Germany
Phone: +49 621 490896-50
Telefax: +49 621 490896-66

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